Honeycomb Networks of Metal Oxides from Self-Assembling PS-PMMA Block Copolymers
نویسندگان
چکیده
1. Applied Physics Program, Northwestern University, Evanston, IL, USA 2. Material Science Division, Argonne National Laboratory, Argonne, IL, USA 3. TechnionIsrael Institute of Technology, Haifa, Israel 4. Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL, USA 5. Energy Science Division, Argonne National Laboratory, Argonne, IL, USA 6. Physics Department, University of Chicago, Chicago, IL, USA
منابع مشابه
Rapid thermal processing of self-assembling block copolymer thin films.
Self-assembling block copolymers generate nanostructured patterns which are useful for a wide range of applications. In this paper we demonstrate the capability to control the morphology of the self-assembling process of PS-b-PMMA diblock copolymer thin films on unpatterned surfaces by means of fast thermal treatment performed in a rapid thermal processing machine. The methodology involves the ...
متن کاملDefect-free nanoporous thin films from ABC triblock copolymers.
The self-assembly of triblock copolymers of poly(ethylene oxide-b-methyl methacrylate-b-styrene) (PEO-b-PMMA-b-PS), where PS is the major component and PMMA and PEO are minor components, provides a robust route to highly ordered, nanoporous arrays with cylindrical pores of 10-15 nm that show promise in block copolymer lithography. These ABC triblock copolymers were synthesized by controlled liv...
متن کاملSolvent-induced novel morphologies in diblock copolymer blend thin films.
We report the morphology and phase behaviors of blend thin films containing two polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with different blending compositions induced by a selective solvent for the PMMA block, which were studied by transmission electron microscopy (TEM). The neat asymmetric PS-b-PMMA diblock copolymers employed in this study, respectively coded as a...
متن کاملExtending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self assembly
Directed self-assembly (DSA) is a promising technique for extending conventional lithographic techniques by being able to print features with critical dimensions under 10 nm. The most widely studied block copolymer system is polystyreneblock-polymethyl methacrylate (PS-b-PMMA). The system is well understood in terms of its synthesis, properties and performance in DSA. However, PS-b-PMMA also ha...
متن کاملInteractions between Ps-Pmma Based Block Copolymers and Wood Derivatives
Multiblock copolymers of polystyrene (PS) and poly(methyl methacrylate) (PMMA) were investigate for use as a model coupling agent for wood-based polymer composites. The PS-PMMA copolymers with approximately 50/50 composition and 150,000 molecular weight were synthesized using atom transfer radical polymerization. The ability of the copolymers to improve the interfacial properties was evaluated ...
متن کامل